| 发明名称 |
A DEVICE FOR AND A METHOD OF MONITORING AN ETCHING PROCEDURE |
| 摘要 |
<p>A device (100) for monitoring an etching procedure comprising a detector unit (102) adapted for detecting etching of a substance of a substrate based on detecting a permittivity of a product (134) of the etching procedure, particularly an exhaust gas (134), generated upon etching the substance.</p> |
| 申请公布号 |
WO2009150556(A1) |
申请公布日期 |
2009.12.17 |
| 申请号 |
WO2009IB52070 |
申请日期 |
2009.05.19 |
| 申请人 |
NXP B.V.;EL NADEIM, SAHEL;VENTER, ISAK |
发明人 |
EL NADEIM, SAHEL;VENTER, ISAK |
| 分类号 |
H01J37/32;G01N27/22;H01L21/66 |
主分类号 |
H01J37/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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