<p>Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.</p>
申请公布号
WO2009148974(A1)
申请公布日期
2009.12.10
申请号
WO2009US45729
申请日期
2009.05.29
申请人
BRION TECHNOLOGIES, INC.
发明人
YE, JUN;CAO, YU;GOOSSENS, RONALD;SHAO, WENJIN;KOONMEN, JIM