发明名称 |
INSPECTION METHOD AND APPARATUS, LITHOGRAPHY APPARATUS, LITHOGRAPHY PROCESSING CELL, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scatterometer measuring method and apparatus that performs measurement using widely spaced wavelengths or wavelength ranges. <P>SOLUTION: The scatterometer has a radiation source that emits radiation with different first and second wavelength ranges. In order to perform color correction according to need in accordance with which wavelength range is used, a variable optical element is provided. Accordingly, the single scatterometer can perform measurement using widely spaced wavelengths. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2009288005(A) |
申请公布日期 |
2009.12.10 |
申请号 |
JP20080139438 |
申请日期 |
2008.05.28 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
DEN BOEF ARIE JEFFREY;STANISLAV Y SMIRNOV;ABEL JOOBEUR |
分类号 |
G01B11/24;G01N21/956;G03F7/20;H01L21/027 |
主分类号 |
G01B11/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|