发明名称 INSPECTION METHOD AND APPARATUS, LITHOGRAPHY APPARATUS, LITHOGRAPHY PROCESSING CELL, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a scatterometer measuring method and apparatus that performs measurement using widely spaced wavelengths or wavelength ranges. <P>SOLUTION: The scatterometer has a radiation source that emits radiation with different first and second wavelength ranges. In order to perform color correction according to need in accordance with which wavelength range is used, a variable optical element is provided. Accordingly, the single scatterometer can perform measurement using widely spaced wavelengths. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009288005(A) 申请公布日期 2009.12.10
申请号 JP20080139438 申请日期 2008.05.28
申请人 ASML NETHERLANDS BV 发明人 DEN BOEF ARIE JEFFREY;STANISLAV Y SMIRNOV;ABEL JOOBEUR
分类号 G01B11/24;G01N21/956;G03F7/20;H01L21/027 主分类号 G01B11/24
代理机构 代理人
主权项
地址