| 摘要 |
<p>PURPOSE: A substrate table, a lithography apparatus and a method for manufacturing a device are provided to prevent splashing and disturbed bulk flow, by providing dipping fluid to a top surface of the table through an opening in the table. CONSTITUTION: A table(WT) comprises openings(300,400) to provide a dipping fluid onto the top surface of the table. The opening surrounds a substrate support frame. The opening is adjacent to an outer edge(490) of the table. The edge within 5 mm of the opening is constituted for the dipping fluid to have an advancing contact angle below 30 degree. The opening is provided in a recess part(100). The opening is connected to each chamber(320,420) through each capillary passage(310,410).</p> |
