APPARATUS FOR CLEANING A SUBSTRATE

摘要

PURPOSE: An apparatus for cleaning a substrate is provided to improve the cleaning strength of the substrate cleaning apparatus by discharging the cleaning solution with impurity. CONSTITUTION: The conveying unit(110) transfers the substrate(S) in the horizontal direction. A plurality of cleansing liquid supply pipes(120) is included in the upward of the conveying unit. And the cleaning solution is offered. A plurality of injection nozzle(130) spreads cleaning solution to substrate. The conveying unit comprises a plurality of shafts(112) and plurality of rollers(114). The angle of inclination of injection nozzles is 45 and 75 degree. The cleansing liquid supply pipes are arranged in perpendicular to the traveling direction of substrate, in parallel.