| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a standard substrate which enables exact inspection of a defect existing in a thin film formed on a substrate. <P>SOLUTION: Fine particles 4, 5 having a known particle size and a uniform grading are attached to the surface of a substrate 1 having a clean surface. As such fine particles, fine particles made of polystyrene, polyacrylate, silica or the like, can be used. Subsequently, a thin film is formed on the surface of the substrate in such a state that the fine particles are attached thereto. As a result, the thin film in which the fine particles to get to model defects artificially formed are contained can be obtained. Subsequent to the formation of such a thin film, at least a part of the fine particles are released from the thin film 2 to form defect parts 3. Release of such fine particles can be performed by supersonic cleaning or scrub cleaning. The obtained defect parts 3 become pinholes, having uniform particle sizes in the thin film 2 and parts from which the fine particles are not released become protruded model defects. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
