摘要 |
A method for exposure is provided to avoid a rise in temperature of a lens set. First, a light beam passes through a first light-receiving region of the lens set to expose a pattern on a substrate, and the first light-receiving region has a rise in temperature. Thereafter, the first light-receiving region is moved away. Afterwards, the light beam passes through a second light-receiving region of the lens set so that the first light-receiving region has a drop in temperature.
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