STATION AND METHOD FOR MEASURING THE CONTAMINATION OF AN ENCLOSURE USED FOR TRANSPORTING SEMICONDUCTOR SUBSTRATES

摘要

The invention relates to a station for measuring the contamination with particles of a transport enclosure used for the atmospheric storage and carriage of semiconductor substrates, the said enclosure comprising a casing that can be closed off by a removable access door, the said station comprising: an interface (5) that can be coupled to a casing of a transport enclosure: (3), in place of the said door, the interface (5) comprising at least one injection nozzle (9) positioned at a moving end of a hose projecting from the said interface in order to direct a jet of gas in a direction perpendicular to a wall portion (13) on the inside (10) of the said casing coupled to the said measurement station so as to detach particles (11) from the said casing (3) through the impinging of the jet of gas against the said wall (13), and a measurement device (7) comprising a vacuum pump (17), a particles meter (19) and a measurement pipe (21) one inlet (23) of which opens to the inside (10) of the said casing (3) and one outlet (25) of which is connected to the vacuum pump (17), the measurement pipe (21) further being connected to the particles meter (19) in order to place the inside (10) of the casing of the transport enclosure (3) coupled to the said measurement section in communication with the particles meter (19). The invention also relates to a method for measuring the contamination with particles of a transport enclosure used for the atmospheric storage and carriage of semiconductor substrates.