| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an XY step exposure device for color filter production, which can maintain the accuracy of flatness of an exposing state even if a mother glass substrate is further enlarged, and ensure a moving speed and positional accuracy. <P>SOLUTION: A stage for holding the mother glass substrate is composed of exposing stages 60b-1 and 60b-2 and a substrate holding stage 70 provided on both side parts parallel to the X-axis of an X-axial slider 40Xb which step-moves the exposing stages in a first axial (X-axis) direction, and the device includes, as a mechanism for the XY step-movement of the mother glass substrate, at least the X-axial slider and suction sliders 40Yb-1 and 40Yb-2. The substrate holding stage is an air floating stage. The size in a second axial (Y-axial) direction of the exposing stage is set corresponding to the size of a photomask. <P>COPYRIGHT: (C)2010,JPO&INPIT |
