| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-sensitivity photosensitive resin composition which has a large solubility contrast without reference to a chemical structure of finally obtained polyimide, forms a pattern having an excellent shape, and is easily synthesized to be obtained at a low cost. <P>SOLUTION: The photosensitive resin composition contains a polyimide precursor having a repeating unit represented by formula (1) (where R<SP>3</SP>and R<SP>4</SP>are each independently a monovalent organic group having a hemiacetal bond), and a photoacid generator. <P>COPYRIGHT: (C)2010,JPO&INPIT |
