发明名称 FILM FORMING DEVICE, FILM FORMING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film forming device that imparts stress larger than stress, imparted under process conditions, to a thin film. SOLUTION: The film forming device includes a processing container 1, a substrate mounting table 3 provided in the processing container 1 and on which a substrate W to be processed is mounted, and a film forming material supply means 27 of supplying a film forming material into the processing container 1, and a spherical hollow 3b or spherical swell is formed on a substrate mounting surface 3a of the substrate mounting table 3 where the substrate W to be processed is mounted. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009246130(A) 申请公布日期 2009.10.22
申请号 JP20080090715 申请日期 2008.03.31
申请人 TOKYO ELECTRON LTD 发明人 YAMASHITA JUN;NISHIDA TATSUO;KONO MASAYUKI;OTAO SHUICHIRO;NAKANISHI TOSHIO
分类号 H01L21/205;H01L21/683;H01L21/768;H01L23/522 主分类号 H01L21/205
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