发明名称 RADIANT ANNEAL THROUGHPUT OPTIMIZATION AND THERMAL HISTORY MINIMIZATION BY INTERLACING
摘要 The time between illumination of adjacent zones of a workpiece edge is extended by a long cool-down period or delay, by interlacing a radiation beam scanning pattern. During the cool-down period, the beam successively scans (along the fast axis) two rows separated by about half the wafer diameter, and travels back and then forth (along the slow axis) across the distance between the two rows, while the radiation beam source continuously generates the beam.
申请公布号 US2009261078(A1) 申请公布日期 2009.10.22
申请号 US20080240035 申请日期 2008.09.29
申请人 APPLIED MATERIALS, INC. 发明人 MA KAI;MAYUR ABHILASH J.;PARIHAR VIJAY
分类号 B23K26/08 主分类号 B23K26/08
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