| 摘要 |
PROBLEM TO BE SOLVED: To eliminate mirror angle errors within a wafer surface in a flat surface optical circuit with a micromirror manufactured by using a diagonal vapor deposition process. SOLUTION: In the flat surface optical circuit having a plurality of optical path changing mirrors within a substrate, a mirror surface direction (β) is so set that the prescribed mirror angle (δ) can be obtained based on the positional relations (D andθ) on the vapor deposition source and the substrate surface in a diagonal vapor deposition process. Namely, the respective mirror manufacturing positions (x and y) and mirror surface direction (β) are controlled by using prescribed formulas 1 and 2 in such a manner that the prescribed mirror angles (δ) (uniform within the substrate) can be obtained based on the positional relations between a vapor deposition source and the manufacturing positions (x and y) of the respective mirrors on the substrate in order to manufacture a plurality of the mirrors with good uniformity within the substrate using the diagonal vapor deposition process. The formulas 1 and 2 are similarly applicable in the case of using diagonal exposure in place of the diagonal vapor deposition. COPYRIGHT: (C)2005,JPO&NCIPI |
