| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad which has superior durability and can be used in both polishing of rough polishing and finish polishing. <P>SOLUTION: In a polishing pad provided with a polishing layer on a base material layer, the polishing layer is composed of a thermosetting polyurethane foaming body containing substantially spherical continuous bubbles. In the polishing layer, a glass transition temperature (Tg) is set in a range of 20°C to 90°C, and a ratio of a storage elastic modulus E'(Tg) in the glass transition temperature (Tg) to a storage elastic modulus E'(Tg-20°C) at a temperature 20°C lower than the glass transition temperature (Tg), i.e. E'(Tg-20°C)/E'(Tg) is 10 or more. <P>COPYRIGHT: (C)2009,JPO&INPIT |
