| 发明名称 |
RESISTOR AND DESIGN STRUCTURE HAVING SUBSTANTIALLY PARALLEL RESISTOR MATERIAL LENGTHS |
| 摘要 |
A resistor and design structure including a pair of substantially parallel resistor material lengths separated by a first dielectric are disclosed. The resistor material lengths have a sub-lithographic dimension and may be spacer shaped.
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| 申请公布号 |
US2009231087(A1) |
申请公布日期 |
2009.09.17 |
| 申请号 |
US20080046643 |
申请日期 |
2008.03.12 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HAKEY MARK C.;LUCE STEPHEN E.;NAKOS JAMES S. |
| 分类号 |
H01C1/012;G06F17/50 |
主分类号 |
H01C1/012 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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