| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for correcting beam drift in a charged particle beam system. SOLUTION: An improved method and apparatus of beam processing corrects for beam drift while a beam is processing a sample. The beam position is aligned using a fiducial that is sufficiently near the working area so that the fiducial is imaged and the sample processed without a stage moving. During processing, the beam positioning is corrected for drift using a model that predicts the drift. COPYRIGHT: (C)2009,JPO&INPIT
|
