| 摘要 |
PROBLEM TO BE SOLVED: To suppress deposition on a sample by a scattering substance and a contamination substance of the sample generated from the sample by charged particle irradiation in a charged particle beam device, and partial parts of other samples generated from the other samples. SOLUTION: This charged particle device is provided with: a charged particle source; an optical mechanism irradiating the sample with the charged particles generated from the charged particle source; and an attaching mechanism having a detection mechanism detecting the charged particles generated from an irradiation object region of the sample by the irradiation of the charged particles, formed arrangeably at a position corresponding to the irradiation object region, and attaching a part of the sample separated from the sample by the irradiation. COPYRIGHT: (C)2009,JPO&INPIT
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