| 摘要 |
An ultraviolet irradiation unit and an ultraviolet irradiation processing apparatus are provided to reduce a necessary cost for supply an inert gas by adjusting an inert gas atmosphere without supply a large amount of the inert gas. In an ultraviolet irradiation unit and an ultraviolet irradiation processing apparatus, a discharge gas is sealed in an enclosure space formed within the discharge vessel. A pair of electrodes is formed on the external surface of the discharge vessel, and a lamp house(5) surrounds a plurality of excimer lamps and the one-direction is opened. A gas supply device(3B,3H) supplies an inactive gas inside the lamp house.
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