发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit that moves the first object and the second object in a first direction within a predetermined plane including a first position opposing the first optical member in a state in which the first object and the second object are close to or in contact with each other and in which positions of the first object and the second object in a second direction within the predetermined plane are shifted.</p>
申请公布号 KR20090092761(A) 申请公布日期 2009.09.01
申请号 KR20097008782 申请日期 2007.09.28
申请人 NIKON CORPORATION 发明人 KIUCHI TOHRU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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