| 摘要 |
<p>A substrate processing method, a computer-readable storage medium, and a substrate processing system are provided to form a pattern dimension of the treated film into the predetermined dimension in a substrate. A substrate processing system(1) performs the predetermined process to the substrate in which the treated film is formed, and the predetermined pattern is formed on the treated film of the substrate. A measurement system(2) measures the film thickness of the treated film the substrate, the refractive index of the treated film, the warpage amount or the absorption coefficient of the treated film. A control device(400) assumes the pattern dimension of the treated film after the predetermined processing based on the measurement result of the entry condition. The correction value is calculated on the estimation result of the pattern dimension. An application development treatment apparatus(3) forms the predetermined pattern on the treated film of substrate.</p> |
