| 摘要 |
A vapor contact-type heating device capable of high-quality heating and processing, which is achieved by enhancing mixing efficiency of vapor and supplying vapor of relatively low pressure. A flow path (45) for raising the pressure of liquid is provided in a vapor mixing pump (4) as fluid sending means, and a vapor supply opening (46) is provided in a casing (43) so as to be opened in the pressure raising flow path (45). As a result, a vapor supply region (47) is formed in the pressure raising flow path (45). ® KIPO & WIPO 2009 |
