发明名称 |
Inspection Method And Inspection System Using Charged Particle Beam |
摘要 |
An electron beam system includes a sample holder to hold a sample, electron optics to obtain an image of the sample, an electrode to control a charged state of the sample, a monitor to determine a range of voltage applied to the electrode, and a processing unit to obtain plural images of different charged states of the sample in accordance with a change of the applied to the electrode and to determine voltage from the voltage contrasts of the images.
|
申请公布号 |
US2009194690(A1) |
申请公布日期 |
2009.08.06 |
申请号 |
US20090423291 |
申请日期 |
2009.04.14 |
申请人 |
NISHIYAMA HIDETOSHI;NOZOE MARI |
发明人 |
NISHIYAMA HIDETOSHI;NOZOE MARI |
分类号 |
G01N23/00;G01N23/225;G21K7/00;H01J37/02;H01J37/22;H01J37/28;H01L21/66 |
主分类号 |
G01N23/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|