发明名称 Inspection Method And Inspection System Using Charged Particle Beam
摘要 An electron beam system includes a sample holder to hold a sample, electron optics to obtain an image of the sample, an electrode to control a charged state of the sample, a monitor to determine a range of voltage applied to the electrode, and a processing unit to obtain plural images of different charged states of the sample in accordance with a change of the applied to the electrode and to determine voltage from the voltage contrasts of the images.
申请公布号 US2009194690(A1) 申请公布日期 2009.08.06
申请号 US20090423291 申请日期 2009.04.14
申请人 NISHIYAMA HIDETOSHI;NOZOE MARI 发明人 NISHIYAMA HIDETOSHI;NOZOE MARI
分类号 G01N23/00;G01N23/225;G21K7/00;H01J37/02;H01J37/22;H01J37/28;H01L21/66 主分类号 G01N23/00
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