发明名称 Capacitor structure and method for preparing the same
摘要 A capacitor structure comprises a substrate having a contact plug, a conductive cylinder positioned on the substrate and an electroplating structure covering the conductive cylinder, wherein a bottom electrode of the capacitor structure comprises the conductive cylinder and the electroplating structure. The conductive cylinder can be a hollow conductive cylinder, and the electroplating structure comprises a first conductive layer covering the inner sidewall and bottom surface of the hollow conductive cylinder and a second conductive layer covering the first conductive layer and the outer sidewall of the hollow conductive cylinder. The conductive cylinder and the electroplating structure can be made of different conductive material, and the free end of the conductive cylinder is preferably round. The conductive cylinder can be made of titanium nitride or tantalum nitride, while the electroplating structure can be made of ruthenium or platinum.
申请公布号 US7569460(B2) 申请公布日期 2009.08.04
申请号 US20060583805 申请日期 2006.10.20
申请人 PROMOS TECHNOLOGIES INC. 发明人 TSAI SHENG DA
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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