发明名称 SURFACE POSITION DETECTING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>The position of a surface to be measured is detected with high accuracy without being influenced by the movement of an optical member. A surface position detecting device comprises a reference member (9) having a reference surface (9a) provided near the surface (Wa) to be measured, a light-transmitting optical system (5 to 8) for directing a measurement light from a first pattern formed on a first pattern surface to the surface to be measured to project an intermediate image of the first pattern, and directing a reference light from a second pattern formed on a second pattern surface to the reference surface to project an intermediate image of the second pattern, a light-receiving optical system (15 to 18) for directing the measurement light reflected from the surface to be measured to a first observation surface to form a first pattern observation image and directing the reference light reflected from the reference surface to a second observation surface to form a second pattern observation image, and a detecting section (11 to 14, PR) for detecting first position information about the first pattern observation image on the first observation surface and second position information about the second pattern observation image on the second observation surface, and detecting the position of the surface to be measured on the basis of the first position information and the second position information.</p>
申请公布号 WO2009093594(A1) 申请公布日期 2009.07.30
申请号 WO2009JP50831 申请日期 2009.01.21
申请人 NIKON CORPORATION;HIDAKA, YASUHIRO 发明人 HIDAKA, YASUHIRO
分类号 H01L21/027;G03F9/02 主分类号 H01L21/027
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