ETCHING COMPOSITION AND METHOD FOR FABRICATING METAL PATTERN USING THE SAME

摘要

An etchant composition, and a method for forming a metal pattern by using the composition are provided to prevent the generation of residue, thereby improving the driving characteristic of a liquid crystal display device. An etchant composition for a single or multilayered film comprising at least one metal of an aluminum-based metal and a molybdenum-based metal, and an indium-based oxide film comprises nitric acid (HNO3) 1 ~ 15 weight%; sulfuric acid (H2SO4) 1 ~ 15 weight%; a potassium salt compound 0.1 ~ 5 weight%; and water 70 ~ 98 weight%. The etchant composition does not contain phosphoric acid (H3PO4).