| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transparent conductive film used for a liquid crystal display, an electroluminescent display device, antistatic conductive film coating, a gas sensor, a solar cell or the like, and a sputtering target for forming the transparent conductive film. <P>SOLUTION: The transparent conductive film is made of (1)0.2-4.0 mass% Ga, 40ppm-2.5 mass% Ce, 74.0-80.1 mass% Zn, and oxygen of the remainder, and has a composition of components wherein the content of the Ce is always smaller than that of the Ga. The sputtering target for forming the transparent conductive film is made of (2) 0.2-4.0 mass% Ga, 40ppm-2.5 mass% Ce, 74.0-80.1 mass% Zn, and oxygen of the remainder, and has a composition of components wherein the content of the Ce is always smaller than that of the Ga. <P>COPYRIGHT: (C)2009,JPO&INPIT |
