发明名称 EQUIPMENT FOR COATING PHOTO-RESISTER SPINNER AND LOADING/UNLOADING METHOD OF WAFER CARRIER AT THE SAME
摘要 <p>A photo spinner apparatus and a wafer carrier loading/unloading method thereof are provided to prevent delay of a photolithography process by using a wafer carrier loader. A photo spinner apparatus includes a spin coater, a baking device, a developer, a transfer and an indexer. The spin coater coats photoresist film on a plurality of wafers(172). The baking device solidifies the coated photoresist film in the coater. The developer develops the solidified photoresist film in the baking device. The transfer carries the plurality of wafers between the developer, the baking device and the spin coater. The indexer has a wafer carrier loader(160). The wafer carrier loader arranges a plurality of wafer carrier(170) to be stacked vertically. The wafer carrier receives the plurality of wafers carried by the transfer.</p>
申请公布号 KR20090077370(A) 申请公布日期 2009.07.15
申请号 KR20080003290 申请日期 2008.01.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YONG SU
分类号 H01L21/68;H01L21/027 主分类号 H01L21/68
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