MULTI-EXPOSURE SYSTEM BY SHIFT OF BEAM

摘要

An exposure system performing the multiple exposure is provided, which enables to make line edge roughness smooth by moving the exposure spot. The reflection mirror reflects the uniform beam which comes from the UV light source through the fly eye lens. The DMD module(Digital Micromirror Device module) is angled around hinge in the oblique direction. The DMD module on/off modulates uniform beam by a plurality of DMDs(Digital Micromirror device). The first projection lens system and the second projection lens system deliver the beam on/off modulated by the DMD module to the substrate. The mask converts shape and size of the beam delivered to substrate through the first projection lens system and the second projection lens system. The beam shift device moves the beam delivered to substrate through the first projection lens system and the second projection lens system in the particular direction.