| 摘要 |
<p>An immersion lithography apparatus and a device manufacturing method are provided to minimize or prevent fully layer leakage or spillage of immersion liquid by modifying a structure thereof. A lithography apparatus includes a lighting system, a supporter, a substrate table(WT), a projection system, a liquid supply system, and a control system. The lighting system is formed to condition a radiation beam(B). The supporter is formed to support a patterning device for adding a pattern to a section of the radiation beams in order to form the patterned radiation beam. The substrate table maintains a substrate(W). The projection system projects the patterned radiation beam on a target part of the substrate. The liquid supply system supplies an immersion liquid between a down stream optic element and a substrate. The control system drives the substrate table In order to perform an acceleration profile for accelerating the substrate table from a first speed of a first direction to a second speed of a second direction.</p> |
