发明名称 SURFACE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment apparatus for preventing a loading effect in surface treatment. SOLUTION: At a first nozzle section 30 of the surface treatment apparatus 1, a first exhaust hole 31 for jetting out reactive gas and a first suction hole 32 for sucking gas are formed while they are separated right and left (in a first direction). A workpiece W is relatively moved in a first direction to the first nozzle section 30 by a moving means 20. A second nozzle section 40 is arranged so that it faces the first nozzle section 30 vertically (in a second direction) while sandwiching a position where the workpiece W is moved relatively. At the second nozzle section 40, a second suction hole 42 for sucking gas between the first and second nozzle sections 30, 40 is formed, and the second suction hole 42 is allowed to oppose the first exhaust hole 31 in a second direction. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009129998(A) 申请公布日期 2009.06.11
申请号 JP20070300939 申请日期 2007.11.20
申请人 SEKISUI CHEM CO LTD 发明人 UMEOKA TAKASHI;KUNUGI SHUNSUKE
分类号 H01L21/3065;C23C16/455;H01L21/205 主分类号 H01L21/3065
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