发明名称 |
METHOD FOR MANUFACTURING ANTIREFLECTION STRUCTURE |
摘要 |
<P>PROBLEM TO BE SOLVED: To manufacture an antireflection structure having a finely rugged portion. <P>SOLUTION: A method for manufacturing an antireflection structure includes steps of: preparing a substrate 27 having a rough surface 27p with a surface roughness larger than a predetermined wavelength; depositing metal in an island state on the rough surface 27p of the substrate 27; and dry etching the substrate 27 by using the island-shaped deposited material 28 as a mask to form a plurality of acicular and finely rugged portions 29 having an average pitch equal to or less than the predetermined wavelength on the rough surface 27p of the substrate 27. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009128543(A) |
申请公布日期 |
2009.06.11 |
申请号 |
JP20070302319 |
申请日期 |
2007.11.21 |
申请人 |
PANASONIC CORP |
发明人 |
TAMURA TAKAMASA;YAMADA KAZUHIRO;ISHIMARU KAZUHIKO;UMETANI MAKOTO |
分类号 |
G02B1/11;B32B7/02;G02B1/02 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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