发明名称 METHOD FOR MANUFACTURING ANTIREFLECTION STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To manufacture an antireflection structure having a finely rugged portion. <P>SOLUTION: A method for manufacturing an antireflection structure includes steps of: preparing a substrate 27 having a rough surface 27p with a surface roughness larger than a predetermined wavelength; depositing metal in an island state on the rough surface 27p of the substrate 27; and dry etching the substrate 27 by using the island-shaped deposited material 28 as a mask to form a plurality of acicular and finely rugged portions 29 having an average pitch equal to or less than the predetermined wavelength on the rough surface 27p of the substrate 27. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009128543(A) 申请公布日期 2009.06.11
申请号 JP20070302319 申请日期 2007.11.21
申请人 PANASONIC CORP 发明人 TAMURA TAKAMASA;YAMADA KAZUHIRO;ISHIMARU KAZUHIKO;UMETANI MAKOTO
分类号 G02B1/11;B32B7/02;G02B1/02 主分类号 G02B1/11
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