| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus and a heat treatment method, capable of executing heat treatment in a short time while preventing the occurrence of problems in processes. SOLUTION: A differential value of a temperature profile at the time point when the temperature of a baking plate becomes a permissible range of a target set temperature is calculated when the set temperature of the baking plate is changed. If the absolute value of the calculated differential value is smaller than a predetermined threshold value, since the inclination of the temperature profile is comparatively gradual and the temperature of the plate is less likely to be deviated from a permissible range, heat treatment is immediately started. On the contrary, if the absolute value of the differential value is larger than the threshold value, since the temperature of the plate is likely to be deviated from the permissible range, heat treatment is started when a time when the temperature of the plate remains within the permissible range of the target set temperature becomes the predetermined set time or more. COPYRIGHT: (C)2009,JPO&INPIT
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