发明名称 |
Polymer, resist composition, and patterning process |
摘要 |
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
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申请公布号 |
US7537880(B2) |
申请公布日期 |
2009.05.26 |
申请号 |
US20070905763 |
申请日期 |
2007.10.03 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;YOSHIHARA TAKAO;KUSAKI WATARU;KOBAYASHI TOMOHIRO;HASEGAWA KOJI |
分类号 |
G03F7/004;C08F24/00;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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