发明名称 |
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method |
摘要 |
A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.
|
申请公布号 |
US2009128793(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20080318574 |
申请日期 |
2008.12.31 |
申请人 |
NIKON CORPORATION |
发明人 |
HARA HIDEAKI;TAKAIWA HIROAKI;ARAI DAI |
分类号 |
G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|