LITHOGRAPHIC APPARATUS, RADIATION SYSTEM, CONTAMINANT TRAP, DEVICE MANUFACTURING METHOD, AND METHOD FOR TRAPPING CONTAMINANTS IN CONTAMINANT TRAP

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus including: a radiation system which includes a supply source for generating a radiation beam, a contaminant trap located in a path of the radiation beam, and an illumination system constituted so as to adjust the radiation beam generated by the supply source; and a support section for supporting a patternizing device.

SOLUTION: This patternizing device works so that a pattern is given to a cross section of an adjusted radiation beam. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting a patternized radiation beam on a target portion of the substrate. The contaminant trap includes a plurality of foils, for forming channels disposed almost in parallel to a transmission direction of the radiation beam. This trap includes a gas supply system located so that a gas is injected into at least one of the channels of the trap.

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