发明名称 Thin Film Continuous Spatially Modulated Grey Attenuators and Filters
摘要 A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
申请公布号 US2009122289(A1) 申请公布日期 2009.05.14
申请号 US20080265235 申请日期 2008.11.05
申请人 ASML HOLDING N.V. 发明人 VLADIMIRSKY YULI;RYZHIKOV LEV;WILKLOW RONALD A.
分类号 G03B27/54 主分类号 G03B27/54
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