发明名称 |
Thin Film Continuous Spatially Modulated Grey Attenuators and Filters |
摘要 |
A system and method for use of a lithography apparatus having a substrate and an absorbing film formed on the substrate. A thickness of the absorbing film is spatially modulated across at least a part of the substrate to reduce a non-uniform intensity of a radiation beam transmitted through the substrate.
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申请公布号 |
US2009122289(A1) |
申请公布日期 |
2009.05.14 |
申请号 |
US20080265235 |
申请日期 |
2008.11.05 |
申请人 |
ASML HOLDING N.V. |
发明人 |
VLADIMIRSKY YULI;RYZHIKOV LEV;WILKLOW RONALD A. |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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