| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of performing the calibration of position of a substrate effectively. <P>SOLUTION: The method includes a step of guiding the substrate into the prealigner of the lithography apparatus, a step of using a detector to measure the position of an alignment mark formed on the substrate being in the opposite side to the position of the detector, and a step of mounting the substrate on a substrate table of the lithography apparatus after the measurement, in which the substrate is positioned on the substrate table so that the alignment mark formed on the side opposite to the substrate can be visible through the window of the substrate table. <P>COPYRIGHT: (C)2009,JPO&INPIT |
