Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

摘要

Sulfonate salts have the formula: R1SO3-CH(Rf)-CF2SO3-M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.