发明名称 METHOD AND SYSTEM FOR CHEMICALLY ENHANCED LASER TRIMMING OF SUBSTRATE EDGES
摘要 An apparatus for processing a peripheral portion of a substrate includes a housing and a spin chuck mounted within the housing and configured to support the substrate in a substantially horizontal orientation. The apparatus also includes a fluid dispense nozzle coupled to the housing and proximate to the peripheral portion of the substrate. The fluid dispense nozzle is in fluid communication with a source of a chemical and configured to direct a flow of the chemical to the peripheral portion of the substrate located at a first radial distance from a center of the substrate. The apparatus further includes a light guide optically coupled to a laser source. The light guide is configured to direct radiation to the peripheral portion of the substrate located at a second radial distance from the center of the substrate greater than the first radial distance.
申请公布号 US2009107519(A1) 申请公布日期 2009.04.30
申请号 US20070929186 申请日期 2007.10.30
申请人 SOKUDO CO., LTD. 发明人 ISHIKAWA TETSUYA;MITSUHASHI TSUYOSHI;XI MING
分类号 B08B7/04 主分类号 B08B7/04
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