An extreme ultraviolet light source device and a method for generating extreme ultraviolet radiation

摘要

High temperature plasma raw material (21) is added drop-wise, for example, and evaporated by irradiation with a laser beam (23). The laser beam (23) passes through a discharge area between a pair of electrodes (21) and irradiates the high temperature plasma raw material (11,12). Pulsed power is applied to the space between the electrodes (11,12) in such a way that discharge current reaches a specified threshold value (Ip) at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes (11,12), plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap (3), is collected by EUV radiation collector optics (2) and then extracted. The irradiation of the laser beam (23) allows selling of the space density of the high temperature plasma raw material (21) to a specified distribution and defining of the position of a discharge channel.