| 摘要 |
The present invention provides an interferometric method and system to measure the height profile of reflecting objects with respect of a reference surface. The method comprises obtaining an image of the object along a specular reflection axis, wherein the image corresponds to an intensity pattern projected on the object along a projection axis, and wherein the specular reflection axis corresponds to a direction along which a portion of the intensity pattern is specularly reflected by the object. Then the method comprises calculating an object phase using the image and determining the height profile using the object phase and a reference phase associated to the reference surface.
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