发明名称 Wafer-Shaped Measuring Apparatus and Method for Manufacturing the Same
摘要 The present invention provides a temperature measuring apparatus with favorable temperature measuring performance and a method of manufacturing the same. A temperature measuring apparatus (10) provided with a temperature sensor (11) arranged on a bottom surface of a depressed section (12c) of a semiconductor wafer (12). The semiconductor wafer (12) and temperature sensor (11) are contacted together through a first contact layer (14) and second contact layer (24). The first and second contact layers (14) and (24) are formed from the same material, concretely a metal with high heat conductivity, and formed to provide virtually even thickness in surface direction. By such first and second contact layers (14) and (24), heat is conducted from the semiconductor wafer (12) to the temperature sensor (11) favorably. Therefore, the temperature measuring apparatus (10) has favorable temperature measuring performance.
申请公布号 US2009085031(A1) 申请公布日期 2009.04.02
申请号 US20070224280 申请日期 2007.03.14
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUDA KENJI;MINAMI TOMOHIDE;YAMANISHI YOSHIKI;HARADA MUNEO
分类号 H01L23/58;H01L21/00 主分类号 H01L23/58
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