| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning a substrate treatment apparatus by using a cleaning transfer member, wherein the cleaning transfer member has an adhesive force necessary for a pasted object, can remove foreign substances of sub-micron level without causing contamination on a cleaning portion, is excellent in heat resistance, exhibits a sufficient adhesive force and a coagulation force even at a high temperature, can be easily peeled off without causing remaining adhesive when being peeled off from the pasted object after being used, and can be re-used after being used. SOLUTION: In this method of cleaning a substrate treatment apparatus by using a cleaning transfer member, the cleaning transfer member is provided with an aggregation layer of oblique columnar structures each protruding with an elevation angle of <90°from the surface of the transfer member and having an aspect ratio of≥1, and the cleaning transfer member is used after completion of cleaning processing. COPYRIGHT: (C)2009,JPO&INPIT
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