发明名称 |
Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby. |
摘要 |
A lithographic spectral filter including a first filter element including a slit having an in plane length dimension arranged in a first direction; and a second filter element arranged at a subsequent position along an optical path of radiation of first and second wavelengths to the first filter element, the second filter element including a slit having an in plane length dimension arranged in a second direction transverse to the first direction, wherein the spectral filter is configured to reflect radiation of a first wavelength and allow transmission of radiation of a second wavelength, the first wavelength being larger than the second wavelength. |
申请公布号 |
NL1035979(A1) |
申请公布日期 |
2009.03.30 |
申请号 |
NL20081035979 |
申请日期 |
2008.09.25 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MAARTEN MARINUS JOHANNES WILHELMUS VAN HERPEN;VADIM YEVGENYEVICH BANINE;WOUTER ANTHON SOER |
分类号 |
G02B27/14;G03F7/20 |
主分类号 |
G02B27/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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