发明名称 Patterning method and display device
摘要 <p>A wet-etching is conducted with a weak acid or weak base etchant to pattern a display device substrate that has a gas-barrier layer comprising at least one organic region and at least one inorganic region. The wet-etching attains high-precision patterning not having any negative influence on the quality of the processed display device.</p>
申请公布号 EP2040318(A2) 申请公布日期 2009.03.25
申请号 EP20080016445 申请日期 2008.09.18
申请人 FUJIFILM CORPORATION 发明人 NISHITA, NOBUHIRO
分类号 H01L51/56;H01L51/00;H01L51/52 主分类号 H01L51/56
代理机构 代理人
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