发明名称 |
METHOD OF RAISING ENERGY BAND GAP OF CRYSTALLINE ALUMINUM OXIDE LAYER, AND METHOD OF MANUFACTURING CHARGE TRAP MEMORY DEVICE PROVIDED WITH CRYSTALLINE ALUMINUM OXIDE HAVING HIGH ENERGY BAND GAP |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of raising the energy band gap of a crystalline aluminum oxide layer, and a method of manufacturing a charge trap memory device provided with a crystalline aluminum oxide layer having a high energy band gap. SOLUTION: The method of raising the energy band gap of an aluminum oxide layer includes a first step of forming an amorphous aluminum oxide layer on a bottom film, a second step of introducing hydrogen (H) or hydroxyl group (OH) into the amorphous aluminum oxide layer, and a third step of crystallizing the amorphous aluminum oxide layer with the introduced hydrogen or hydroxyl group. Thus, the energy band gap of the crystallized aluminum oxide layer is not less than 7.0 eV. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009055030(A) |
申请公布日期 |
2009.03.12 |
申请号 |
JP20080214473 |
申请日期 |
2008.08.22 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
CHOI SANG-MOO;SUNG JUNG-HUN;SETSU KOSHU;SHIN WOONG-CHUL;PARK SANG-JIN |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
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