发明名称 Exposure apparatus
摘要 With respect to each of a plurality of shots on a substrate, a line or surface is calculated which approximates a plurality of positions of the surface of the substrate detected by a detector with respect to a plurality of places, and the difference between the position of the surface detected by the detector and the position of the line or surface in the direction of the optical axis of a projection optical system is calculated with respect to each of the plurality of places. With respect to each of the plurality of places, the differences are averaged over the plurality of shots to determine an offset value.
申请公布号 US7502098(B2) 申请公布日期 2009.03.10
申请号 US20070845650 申请日期 2007.08.27
申请人 CANON KABUSHIKI KAISHA 发明人 YOSHIMURA KEIJI
分类号 G03B27/52;G03B27/42 主分类号 G03B27/52
代理机构 代理人
主权项
地址