发明名称 |
PATTERNING NANOWIRES ON SURFACES FOR FABRICATING NANOSCALE ELECTRONIC DEVICES |
摘要 |
The present invention relates to a method of depositing nanowires on the surface of a substrate, comprising the steps of:-contacting defined regions of the substrate with at least one compound (C1) capable of binding to the surface of the substrate and of binding the nanowires to provide a pattern of binding sites on the surface of the substrate and/or contacting defined regions of the substrate with at least one compound (C2) capable of binding to the surface of the substrate and preventing the binding of nanowires to provide a pattern of non-binding sites on the surface of the substrate, and-contacting the surface of the substrate with a suspension of nanowires in a liquid medium to enable at least a portion of the applied nanowires to bind to at least a portion of the surface of the substrate covered with (C1) and/or not covered with (C2).
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申请公布号 |
KR20090019845(A) |
申请公布日期 |
2009.02.25 |
申请号 |
KR20087030877 |
申请日期 |
2008.12.18 |
申请人 |
BASF SE;THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY |
发明人 |
GOMEZ MARCOS;RICHTER FRAUKE;ERK PETER;BAO ZHENAN;LIU SHUHONG |
分类号 |
B82B3/00;B82B1/00;H01L51/10 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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