| 发明名称 |
Measurement of etching |
| 摘要 |
Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
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| 申请公布号 |
US7494596(B2) |
申请公布日期 |
2009.02.24 |
| 申请号 |
US20030393735 |
申请日期 |
2003.03.21 |
| 申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
BARNES TED W.;CHAVARRIA VICTORIO;SUDYKA WILLIAM J.;GHOZEIL ADAM;EMERY TIMOTHY R. |
| 分类号 |
B41J2/045;H01L21/306;B41J2/055;B41J2/16;C23F1/02;C23F1/24;C23F4/00;G01N27/04;H01L21/3065 |
主分类号 |
B41J2/045 |
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