METHOD OF FORMING PATTERN AND, FOR USE THEREIN, RADIATION-SENSITIVE RESIN COMPOSITION AND RESIN HAVING RADIATION-SENSITIVE ACID GENERATING GROUP

摘要

A method of pattern forming that is suitable for use in the formation of fine pattern by electron beams, X-rays or extreme-ultraviolet rays; and, for use therein, a radiation-sensitive resin composition and resin having radiation-sensitive acid generating group. In this method of pattern forming, by irradiation with actinic rays or radial rays, an acid is generated from a resin having radiation-sensitive acid generating group contained as a resin component in a radiation-sensitive resin composition, in which there is contained a radiation-sensitive acid generating group and contained no group generating hydroxyl or carboxyl by acid action, so that the solubility in developer of the resin having radiation-sensitive acid generating group is increased to thereby attain formation of resist pattern. This radiation-sensitive resin composition is one containing only a resin having acid generating group as its resin component.